China's First Domestic DUV Lithography Scanners

A Chinese company, Shanghai Yuliangsheng Technology, has begun manufacturing its own DUV immersion optical lithography scanners, according to reporting cited on 2026-08-04. Until now, China had no domestic alternative to Western suppliers, led by the Dutch firm ASML, for these machines, which use argon-fluoride excimer lasers at a 193 nm wavelength and improve resolution by refracting light through a liquid medium. The development is significant as a self-sufficiency milestone rather than a technological breakthrough, since DUV immersion has been in commercial use for decades and ASML also produces comparable tools.
Production Volume and Likely Customers
Output is initially low: only five units are expected in 2026, with planned scale-up to around 20 machines per year from 2027. By comparison, ASML reportedly delivered 131 machines serving the same purpose to the market in 2026. Shanghai Yuliangsheng expects buyers to include Chinese foundries SMIC and Hua Hong and memory maker CXMT, firms that have faced restrictions on access to advanced Western lithography equipment.
Component Sourcing and EUV Gap
The machines are not yet fully built from Chinese parts; some components, possibly including key elements, are imported from Japan. More fundamentally, the new Chinese line does not address EUV, the 13.5 nm extreme-ultraviolet technology that ASML alone supplies and that is required for 5 nm and smaller logic nodes and the latest DRAM generations. EUV capability would require generating plasma from vaporised tin droplets, a step far beyond the DUV machines now entering production, and no timeline for a Chinese EUV system has been disclosed in the available reporting.
US Pressure Over EUV Shipments to China
Separately on 2026-08-04, US Commerce Secretary Howard Lutnick was reported to have raised concerns in meetings with ASML executives that EUV-related components and transport equipment may have been shipped to China. ASML and its CEO Christophe Fouquet deny any EUV machine is or has been in China, citing internal firewalls and the technical and financial difficulty of building such a system. A bipartisan bill in Congress is also proposing to ban ASML's DUV shipments to China, adding a further layer of export-control pressure beyond the existing EUV restrictions.
Competing Evidence and Unresolved Questions
The two strands of reporting point in opposite directions on the same underlying question of how China sources advanced lithography. One account frames Shanghai Yuliangsheng's DUV scanners as evidence of growing domestic self-sufficiency, while the other frames Lutnick's warnings as a possible channel through which EUV technology could have reached China despite denials. ASML's commercial strategy of continuing to sell older-generation DUV tools to China is described as a deliberate effort to preserve a generational gap rather than a loophole, yet US officials continue to scrutinise those shipments. The disagreement leaves unresolved whether any EUV capability has actually crossed into China and whether DUV sales will face new restrictions.
Next Verifiable Milestones
Near-term checkpoints include Shanghai Yuliangsheng's reported 2027 ramp to roughly 20 DUV machines per year, the progress of the US congressional bill that would ban ASML's DUV shipments to China, and any further findings from the Commerce Department's review of suspected EUV-related transfers.
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